CVD/PECVD Tube Furnace

CVD/PECVD Tube Furnace

Brother CVD / PECVD tube furnace is a thin film deposition equipment based on plasma chemical vapor deposition technology, which can deposit thin films on various materials, including metals,

Brother CVD / PECVD tube furnace is a thin film deposition equipment based on plasma chemical vapor deposition technology, which can deposit thin films on various materials, including metals, semiconductors, insulators,etc. It can be widely used in microelectronics, optoelectronics, flat panel display, energy storage and other fields.

CVD/PECVD Tube Furnace Features

  • High film deposition rate: RF glow technology, greatly increasing the deposition rate of the film, the deposition rate can reach 10Å / S
  • High area uniformity: Advanced multi-point RF feeding technology, special gas path distribution, and heating technology, etc., make the film uniformity index reach 8%
  • High consistency: using the advanced design concept of the semiconductor industry, the deviation between the substrates of one deposition is less than 2%
  • High process stability: Highly stable equipment ensures a continuous and stable process.
  • Maximum temperature: 1200℃ (Heating wires)

  • 50 segments programmable PID auto control.

  • double shell and air-cooled structure, furnace surface temperature below 50℃

  • 304 stainless steel double sealing flange.

  • Adjustable flange support structure at both ends to extend the service life of the furnace tube.

  • Over-temperature protection function: when the temperature exceeds the allowed setting value automatically power off.

  • Safety protection: when the furnace has an electrical leakage, power off automatically.

  • Heating rate ≦20 C/ min

  • Temperature control accuracy ±1℃.

  • Maximum vacuum degree -0.1M Pa.

  • Equipped with molecular pump, max. vacuum up to 7x10-4 Pa.


Standard Parts

  • Tube plug 2pcs
  • Furnace tube 1pc

    Vacuum pump 1set

    Vacuum sealing flange 1set

    Vacuum pressure gauge 1pc


    Optional Parts

    Vacuum system (rotary vane mechanical pump, diffusion pump, molecular pump)

    Atmosphere system (float flowmeter, mass flowmeter)

    Quick discharge flange, tee flange

    7-inch HD touch screen


    pecvd (1)


    CVD PECVD Tube Furnace Technical Parameters

    ModelTube Dia*Heating Zone (mm)

    Power
    ( kw )

    Max. Temp (℃)
    Working Temp (℃)Gas ControlMax. Vacuum

    BR-CVD-60

    60*400

    3120011003 Way10 Pa or 7x10-3 Pa
    BR-CVD-80

    80*400

    4120011003 Way10 Pa or 7x10-3 Pa
    BR-CVD-100

    100*400

    6120011003 Way10 Pa or 7x10-3 Pa


    ModelTube Dia*Heating Zone (mm)

    Power
    ( kw )

    Max. Temp (℃)
    Working Temp (℃)RF FrequencyRF Power (W)Gas ControlMax. Vacuum

    BR-PECVD-60

    60*450

    412001100

    13.56MHz ± 0.005%

    300 - 5003 Way10 Pa or 7x10-3 Pa
    BR-PECVD-80

    80*450

    512001100

    13.56MHz ± 0.005%

    300 - 5003 Way10 Pa or 7x10-3 Pa
    BR-PECVD-100

    100*450

    712001100

    13.56MHz ± 0.005%

    300 -5003 Way10 Pa or 7x10-3 Pa

    *Other size can be customized.


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